The Effect of Match between High Power Impulse and Bias Voltage: TiN Coating Deposited by High Power Impulse Magnetron Sputtering

Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has revealed that output bias current depends on total energy cathodes, which means voltage settings do not necessarily match actual output. In this study, we investigated effects and characteristics titanium nitride thin films produced using sputtering. The values were adjusted by varying supplied cathode substrate under DC pulsed-DC models. Our results pulse delay (PD) feed forward (FF) can be used to control voltage. Increasing from 0.56 0.84 was shown alter preferred orientation (111) (220), increase deposition rate, lead a corresponding film thickness. surface morphology all samples exhibited tapered planes attributable low (−30 V). maximum hardness as follows: mode (23 GPa) (19 GPa). lower attributed residual stress, orientation, morphology. hydrophobic, with contact angles >100°.